OPTIMAL platform
Project: OPTIMAL
Updated at: 30-01-2024
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Public Consultation - MiE 25-27 Priorities (input is publicly available)
The OPTIMAL project will integrate for the first-time different laser lithography technologies, quality monitoring systems and processes in one platform for the development of structures with high depth, dimensions in the range from 100 nm to sub-mm, 2D&3D shape on flat surface, combining parallel & serial patterning, no need for external treatments on samples, increased speed and large area. The OPTIMAL consortium consists of three research institutes (JOR, ISE, ILC), one university (UPR), member of the Italian Photonics Association, three Small Medium Enterprises (MRT, DPX, HYP), two big industries, leaders in their corresponding market (SDA and BCD).