OPTIMAL platform
Project: OPTIMAL
Updated at: 30-01-2024
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Public Consultation - MiE 25-27 Priorities (input is publicly available)
The OPTIMAL approach involves various disciplines, which interact with each other in order to achieve the project objectives. Material research and photochemistry is needed to develop the suitable photoresists (MRT). Laser technology knowledge (JOR, ISE) is required for developing novel laser lithography methods, machines, and processes. The electronics finds its application in the optical based sensors for in-line monitoring, controlling the laser sources and patterning (ILC, DPX). The software engineering expertise (UPR) completes the required skills for the development of self-learning algorithms for generating the virtual photomasks. Mechanical and environmental engineering deal with the equipment and manufacturing processes and their life cycle assessment (JOR). Experts in training and communication science (ILC, UPR) will design workshops and training materials to explain and promote the developed technologies to broad public and stakeholders.