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Comment:

A highly innovative multileve micro-nanostructuring technology will be used for the first time for producing functional geometries on full sized components, based on the combination of coated microstructured parts with the nanofunctionalization by means of selective etch-resistant implantation and controlled plasma treatment. This is a highly productive and highly controlled way to generate the desired nanostructures which will be then transfer at high productivity to the final product using microrreplication.
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