Multi party privacy preserving machine learning for process control

This is a publication. If there is no link to the publication on this page, you can try the pre-formated search via the search engines listed on this page.

Authors: Wilfried Verachtert, Tom Ashby, Imen Chakroun, Roel Wuyts, Sayantan Das, Sandip Halder, Philippe Leray

Journal title: Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV

Journal publisher: SPIE

Published year: 2021

Published pages: 42

DOI identifier: 10.1117/12.2584893

ISBN: 9781510640566