High Throughput Scanning Probe Metrology for High-NA EUV photoresist profiling

Summary

This is a publication. If there is no link to the publication on this page, you can try the pre-formated search via the search engines listed on this page.

Authors: Artem Khatchaturiants, Marta Mucientes, Arseniy Kalinin, Yan Guo, Seokhan Kim, Alain Moussa, Janusz Bogdanowicz, Joren Severi, Gian Lorusso, Danilo De Simone, Anne-Laure Charley, Philippe Leray, Maarten E. van Reijzen, Cornel Bozdog, Hamed M. Sadeghian

Journal title: Proceedings SPIE Volume PC12053, Metrology, Inspection, and Process Control XXXVI; PC120530I (2022)

Journal publisher: SPIE

Published year: 2022

DOI identifier: 10.1117/12.2616089

Structured mapping
Unfold all
/
Fold all
Publication
CORDA