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Process chain based on self-assembly processes (polymer demixing, nanosphere lithography, interference lithography) for the fabrication of nanostructure replication tools

Process chain based on self-assembly processes (polymer demixing, nanosphere lithography, interference lithography) for the fabrication of nanostructure replication tools
Summary
- The use of durable materials to make the insert ensures longer tool-lifetime - The self assembled features allow large area surface micronanostructuring - The fabrication of high aspect ratio micro-nanostructure in mold inserts - The combination of Self-Assembly structuring with standard replication techniques (embossing, injection molding) increases very much the possibility for the manufacturing of nanostructures in industrial environment
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Country: SWITZERLAND
Address: CSEM - Neuchatel
Geographical location(s)