Process chain based on self-assembly processes (polymer demixing, nanosphere lithography, interference lithography) for the fabrication of nanostructure replication tools

Process chain based on self-assembly processes (polymer demixing, nanosphere lithography, interference lithography) for the fabrication of nanostructure replication tools
Summary
- The use of durable materials to make the insert ensures longer tool-lifetime - The self assembled features allow large area surface micronanostructuring - The fabrication of high aspect ratio micro-nanostructure in mold inserts - The combination of Self-Assembly structuring with standard replication techniques (embossing, injection molding) increases very much the possibility for the manufacturing of nanostructures in industrial environment
More information
Country: SWITZERLAND
Address: CSEM - Neuchatel
Process chain based on self-assembly processes (polymer demixing, nanosphere lithography, interference lithography) for the fabrication of nanostructure replication tools
Contacts
Not specified (see website if available)
Organisations
  • Not specified