Pushing deep greyscale lithography beyond 100 µm pattern depth with a novel photoresist

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Authors: Christine Schuster, Gerda Ekindorf, Anja Voigt, Arne Schleunitz, Gabi Grützner

Journal title: Proceedings Volume 12497, Novel Patterning Technologies

Journal number: Volume 12497

Journal publisher: SPIE - Proceedings Volume 12497, Novel Patterning Technologies 2023; 124970P (2023)

Published year: 2023

DOI identifier: 10.1117/12.2661526