Dynamic, Adaptive Inline Process Monitoring for Laser Material Processing by Means of Low Coherence Interferometry

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Authors: Fabian Zechel, Julia Jasovski, Robert H. Schmitt

Journal title: Applied Sciences

Journal number: 11/16

Journal publisher: Applied Science

Published year: 2021

Published pages: 7556

DOI identifier: 10.3390/app11167556

ISSN:2076-3417