The OPTIMAL project will integrate for the first-time different laser lithography technologies, quality monitoring systems and processes in one platform for the development of structures with high depth, dimensions in the range from 100 nm to sub-mm, 2D&3D shape on flat surface, combining parallel & serial patterning, no need for external treatments on samples, increased speed and large area. The OPTIMAL project uses self-learning algorithms to optimize the virtual photomask as well as integrates methods for an inline control of the laser patterning.
Laser-based technologies for creating structures in the range from nanometer up to millimeter size find many applications such as free form optics, photonics, multifunctional surfaces, lab-on-chip, etc. with a global market volume of > 200 billion euros. The original structures, known as masters, are the first step in the making of tools for key-enabling technologies like injection molding or nanoimprinting. Some of the current limitations in the laser lithography processes are the limited depth of the structures, small area and low speed at process level, high-power consumption in the laser interference lithography, and multiple and expensive processes required for the development of hierarchical multifunctional structures at industrial level.
| Web resources: | https://www.optimal-project.eu/ - OPTIMAL project website |
The OPTIMAL project will integrate for the first-time different laser lithography technologies, quality monitoring systems and processes in one platform for the development of structures with high depth, dimensions in the range from 100 nm to sub-mm, 2D&3D shape on flat surface, combining parallel & serial patterning, no need for external treatments on samples, increased speed and large area. The OPTIMAL consortium consists of three research institutes (JOR, ISE, ILC), one university (UPR), member of the Italian Photonics Association, three Small Medium Enterprises (MRT, DPX, HYP), two big industries, leaders in their corresponding market (SDA and BCD).
The OPTIMAL platform will be validated through the manufacturing of master tools for four different use cases: a) full-polymer micro lenses for industrial optics, b) hierarchical multifunctional drag reduction riblet structures for aviation, c) free-form lens arrays for high-end virtual reality displays and d) microfluidic hierarchical structures for lab on chip medical devices.The OPTIMAL consortium consists of three research institutes (JOR, ISE, ILC), one university (UPR), member of the Italian Photonics Association, three Small Medium Enterprises (MRT, DPX, HYP), two big industries, leaders in their corresponding market (SDA and BCD).
By accelerating and upscaling the structuring process, the OPTIMAL project will increase the process efficiency and yield, which will allow for “first time right” fabrication of the required structures, lower consumption of resources, waste reduction, lower CO2 emissions, increase of productivity, and cost reduction.
By accelerating and upscaling the structuring process, the OPTIMAL project will increase the process efficiency and yield, which will allow for “first time right” fabrication of the required structures, lower consumption of resources, waste reduction, lower CO2 emissions, increase of productivity, and cost reduction.
The OPTIMAL project uses self-learning algorithms to optimize the virtual photomask as well as integrates methods for an inline control of the laser patterning.
By accelerating and upscaling the structuring process, the OPTIMAL project will increase the process efficiency and yield, which will allow for “first time right” fabrication of the required structures, lower consumption of resources, waste reduction, lower CO2 emissions, increase of productivity, and cost reduction.
The OPTIMAL project uses self-learning algorithms to optimize the virtual photomask as well as integrates methods for an inline control of the laser patterning.
The OPTIMAL project uses self-learning algorithms to optimize the virtual photomask as well as integrates methods for an inline control of the laser patterning.
The OPTIMAL project will integrate for the first-time different laser lithography technologies, quality monitoring systems and processes in one platform for the development of structures with high depth, dimensions in the range from 100 nm to sub-mm, 2D&3D shape on flat surface, combining parallel & serial patterning, no need for external treatments on samples, increased speed and large area.
By accelerating and upscaling the structuring process, the OPTIMAL project will increase the process efficiency and yield, which will allow for “first time right” fabrication of the required structures, lower consumption of resources, waste reduction, lower CO2 emissions, increase of productivity, and cost reduction.
By accelerating and upscaling the structuring process, the OPTIMAL project will increase the process efficiency and yield, which will allow for “first time right” fabrication of the required structures, lower consumption of resources, waste reduction, lower CO2 emissions, increase of productivity, and cost reduction.
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The OPTIMAL approach involves various disciplines, which interact with each other in order to achieve the project objectives. Material research and photochemistry is needed to develop the suitable photoresists (MRT). Laser technology knowledge (JOR, ISE) is required for developing novel laser lithography methods, machines, and processes. The electronics finds its application in the optical based sensors for in-line monitoring, controlling the laser sources and patterning (ILC, DPX). The software engineering expertise (UPR) completes the required skills for the development of self-learning algorithms for generating the virtual photomasks. Mechanical and environmental engineering deal with the equipment and manufacturing processes and their life cycle assessment (JOR). Experts in training and communication science (ILC, UPR) will design workshops and training materials to explain and promote the developed technologies to broad public and stakeholders.