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OPTIMAL platform

Project: OPTIMAL

Updated at: 30-01-2024

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MiE WP26-27 Consultation and context pointers
MiE_25-27_RP11: Digitally enabled compliance and integration of innovative manufacturing solutions
Comment:

The OPTIMAL project uses self-learning algorithms to optimize the virtual photomask as well as integrates methods for an inline control of the laser patterning.

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