EFFRA Innovation Portal

Modelling Ion Production inside an Electron Impact Ionizer for High-Vacuum Gas Analysis

Project: MADEin4

Updated at: 29-04-2024

D6.3.3: SEMI Technology Unites Global Summit Dissemination Factsheets

Project: MADEin4

Updated at: 29-04-2024

Projection methods for high numerical aperture phase retrieval

Project: MADEin4

Updated at: 29-04-2024

Selective plasma etching of silicon-containing high chi block copolymer for directed self-assembly (DSA) application

Project: MADEin4

Updated at: 29-04-2024

A fusion of electronic design, process and metrology in semiconductor manufacturing for improved process optimization an...

Project: MADEin4

Updated at: 29-04-2024

Surface Topography of Si/TiO2 Stacked Layers on Silicon Substrate Deposited by KrF Excimer Laser Ablation

Project: MADEin4

Updated at: 29-04-2024

SYSTEM AND METHOD FOR INSPECTION AND METROLOGY OF FOUR SIDES OF SEMICONDUCTOR DEVICES

Project: MADEin4

Updated at: 29-04-2024

COMBINED TRANSMITTED AND REFLECTED LIGHT IMAGING OF INTERNAL CRACKS IN SEMICONDUCTOR DEVICES

Project: MADEin4

Updated at: 29-04-2024

PROLIFIC: A Fast and Robust Profile-Likelihood-Based Muscle Onset Detection in Electromyogram Using Discrete Fibonacci S...

Project: MADEin4

Updated at: 29-04-2024

Penalized wavelet estimation and robust denoising for irregular spaced data

Project: MADEin4

Updated at: 29-04-2024

Penalised robust estimators for sparse and high-dimensional linear models

Project: MADEin4

Updated at: 29-04-2024

Flexible, boundary adapted, nonparametric methods for the estimation of univariate piecewise-smooth functions

Project: MADEin4

Updated at: 29-04-2024

Predictive discarding of wafers based on power leakage predictions from single layer misalignment data

Project: MADEin4

Updated at: 29-04-2024

Phase retrieval from overexposed PSF: a projection-based approach

Project: MADEin4

Updated at: 29-04-2024

Increase of wafer inspection tool throughput with computational imaging

Project: MADEin4

Updated at: 29-04-2024

D6.3.5: ENBIS 2021 data management / machine learning Workshop Dissemination Factsheet

Project: MADEin4

Updated at: 29-04-2024

Virtual Metrology to Eliminate Test Wafers Measurements on Copper Electroplating Deposition

Project: MADEin4

Updated at: 29-04-2024

Wavelet-based robust estimation and variable selection in nonparametric additive models

Project: MADEin4

Updated at: 29-04-2024

Pulsed Laser Deposition of SWCNTs on Carbon Fibres: Effect of Deposition Temperature

Project: MADEin4

Updated at: 29-04-2024

Similarity-based Brownian Motion Approach for Remaining Useful Life Prediction

Project: MADEin4

Updated at: 29-04-2024

Analysis of Line-Edge Roughness Using EUV Scatterometry

Project: MADEin4

Updated at: 29-04-2024

High-NA EUV photoresist metrology using high-throughput scanning probe microscopy

Project: MADEin4

Updated at: 29-04-2024

MFIG - a Mass Filtered Ion Gauge

Project: MADEin4

Updated at: 29-04-2024

High-Speed Tapping Mode AFM Utilizing Recovery of Tip-Sample Interaction

Project: MADEin4

Updated at: 29-04-2024

Prediction of Yield in semiconductor production from defects optically detected on the Wafers

Project: MADEin4

Updated at: 29-04-2024

Simulations of the Ultra-Fast Kinetics in Ni-Si-C Ternary Systems under Laser Irradiation

Project: MADEin4

Updated at: 29-04-2024

Inter-diffusion, melting and reaction interplay in Ni/4H-SiC under excimer laser annealing

Project: MADEin4

Updated at: 29-04-2024

Periodic Reporting for period 3 - MADEin4 (Metrology Advances for Digitized ECS industry 4.0)

Project: MADEin4

Updated at: 29-04-2024

TXRF/GIRXF high precision laboratory setup with high flux monochromatic sources

Project: MADEin4

Updated at: 29-04-2024

Closed-Loop Active Model Diagnosis Using Bhattacharyya Coefficient: Application to Automated Visual Inspection.

Project: MADEin4

Updated at: 29-04-2024

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Modelling Ion Production inside an Electron Impact Ionizer for High-Vacuum Gas Analysis

D6.3.3: SEMI Technology Unites Global Summit Dissemination Factsheets

Projection methods for high numerical aperture phase retrieval

Selective plasma etching of silicon-containing high chi block copolymer for directed self-assembly (DSA) application

A fusion of electronic design, process and metrology in semiconductor manufacturing for improved process optimization an...

Surface Topography of Si/TiO2 Stacked Layers on Silicon Substrate Deposited by KrF Excimer Laser Ablation

SYSTEM AND METHOD FOR INSPECTION AND METROLOGY OF FOUR SIDES OF SEMICONDUCTOR DEVICES

COMBINED TRANSMITTED AND REFLECTED LIGHT IMAGING OF INTERNAL CRACKS IN SEMICONDUCTOR DEVICES

PROLIFIC: A Fast and Robust Profile-Likelihood-Based Muscle Onset Detection in Electromyogram Using Discrete Fibonacci S...

Penalized wavelet estimation and robust denoising for irregular spaced data

Penalised robust estimators for sparse and high-dimensional linear models

Flexible, boundary adapted, nonparametric methods for the estimation of univariate piecewise-smooth functions

Predictive discarding of wafers based on power leakage predictions from single layer misalignment data

Phase retrieval from overexposed PSF: a projection-based approach

Increase of wafer inspection tool throughput with computational imaging

D6.3.5: ENBIS 2021 data management / machine learning Workshop Dissemination Factsheet

Virtual Metrology to Eliminate Test Wafers Measurements on Copper Electroplating Deposition

Wavelet-based robust estimation and variable selection in nonparametric additive models

Pulsed Laser Deposition of SWCNTs on Carbon Fibres: Effect of Deposition Temperature

Similarity-based Brownian Motion Approach for Remaining Useful Life Prediction

Analysis of Line-Edge Roughness Using EUV Scatterometry

High-NA EUV photoresist metrology using high-throughput scanning probe microscopy

MFIG - a Mass Filtered Ion Gauge

High-Speed Tapping Mode AFM Utilizing Recovery of Tip-Sample Interaction

Prediction of Yield in semiconductor production from defects optically detected on the Wafers

Simulations of the Ultra-Fast Kinetics in Ni-Si-C Ternary Systems under Laser Irradiation

Inter-diffusion, melting and reaction interplay in Ni/4H-SiC under excimer laser annealing

Periodic Reporting for period 3 - MADEin4 (Metrology Advances for Digitized ECS industry 4.0)

TXRF/GIRXF high precision laboratory setup with high flux monochromatic sources

Closed-Loop Active Model Diagnosis Using Bhattacharyya Coefficient: Application to Automated Visual Inspection.