EFFRA Innovation Portal

Virtual Metrology to Eliminate Test Wafers Measurements on Copper Electroplating Deposition

Project: MADEin4

Updated at: 29-04-2024

Similarity-based Brownian Motion Approach for Remaining Useful Life Prediction

Project: MADEin4

Updated at: 29-04-2024

Analysis of Line-Edge Roughness Using EUV Scatterometry

Project: MADEin4

Updated at: 29-04-2024

Pulsed Laser Deposition of SWCNTs on Carbon Fibres: Effect of Deposition Temperature

Project: MADEin4

Updated at: 29-04-2024

MFIG - a Mass Filtered Ion Gauge

Project: MADEin4

Updated at: 29-04-2024

High-NA EUV photoresist metrology using high-throughput scanning probe microscopy

Project: MADEin4

Updated at: 29-04-2024

High-Speed Tapping Mode AFM Utilizing Recovery of Tip-Sample Interaction

Project: MADEin4

Updated at: 29-04-2024

Prediction of Yield in semiconductor production from defects optically detected on the Wafers

Project: MADEin4

Updated at: 29-04-2024

TXRF/GIXRF high precision laboratory setup with high flux monochromatic source

Project: MADEin4

Updated at: 29-04-2024

Simulations of the Ultra-Fast Kinetics in Ni-Si-C Ternary Systems under Laser Irradiation

Project: MADEin4

Updated at: 29-04-2024

Inter-diffusion, melting and reaction interplay in Ni/4H-SiC under excimer laser annealing

Project: MADEin4

Updated at: 29-04-2024

TXRF/GIRXF high precision laboratory setup with high flux monochromatic sources

Project: MADEin4

Updated at: 29-04-2024

Periodic Reporting for period 3 - MADEin4 (Metrology Advances for Digitized ECS industry 4.0)

Project: MADEin4

Updated at: 29-04-2024

Closed-Loop Active Model Diagnosis Using Bhattacharyya Coefficient: Application to Automated Visual Inspection.

Project: MADEin4

Updated at: 29-04-2024

Automatic Defect Detection in Epitaxial Layers by Micro Photoluminescence Imaging

Project: MADEin4

Updated at: 29-04-2024

Electrodeposition of NiSn-rGO Composite Coatings from Deep Eutectic Solvents and Their Physicochemical Characterization

Project: MADEin4

Updated at: 29-04-2024

LASSO-based Health Indicator Extraction Method for Semiconductor Manufacturing Processes

Project: MADEin4

Updated at: 29-04-2024

Data fusion by artificial neural network for hybrid metrology development

Project: MADEin4

Updated at: 29-04-2024

Multi-branch neural network for hybrid metrology improvement

Project: MADEin4

Updated at: 29-04-2024

MFIG — A Mass Filtered Ion Gauge

Project: MADEin4

Updated at: 29-04-2024

An optical system and image processing tool for predicting PIN malfunctioning in growth Chambers of semiconductors

Project: MADEin4

Updated at: 29-04-2024

Structural and electrical characterization of Ni-based ohmic contacts on 4H-SiC formed by solid-state laser annealing

Project: MADEin4

Updated at: 29-04-2024

Robust Classification of Intramuscular EMG Signals to Aid the Diagnosis of Neuromuscular Disorders

Project: MADEin4

Updated at: 29-04-2024

Particle detection using closed-loop active model diagnosis

Project: MADEin4

Updated at: 29-04-2024

Closed-loop active object recognition with constrained illumination power

Project: MADEin4

Updated at: 29-04-2024

Predictive virtual processes, metrology and maintenance in power device manufacturing

Project: MADEin4

Updated at: 29-04-2024

High Throughput Scanning Probe Metrology for High-NA EUV photoresist profiling

Project: MADEin4

Updated at: 29-04-2024

Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography

Project: MADEin4

Updated at: 29-04-2024

Study of plasma etching impact on chemoepitaxy directed self-assembly

Project: MADEin4

Updated at: 29-04-2024

D6.3.4: SEMICON Europa 2021 Dissemination Factsheets

Project: MADEin4

Updated at: 29-04-2024

Resources

Selected filters:

Virtual Metrology to Eliminate Test Wafers Measurements on Copper Electroplating Deposition

Similarity-based Brownian Motion Approach for Remaining Useful Life Prediction

Analysis of Line-Edge Roughness Using EUV Scatterometry

Pulsed Laser Deposition of SWCNTs on Carbon Fibres: Effect of Deposition Temperature

MFIG - a Mass Filtered Ion Gauge

High-NA EUV photoresist metrology using high-throughput scanning probe microscopy

High-Speed Tapping Mode AFM Utilizing Recovery of Tip-Sample Interaction

Prediction of Yield in semiconductor production from defects optically detected on the Wafers

TXRF/GIXRF high precision laboratory setup with high flux monochromatic source

Simulations of the Ultra-Fast Kinetics in Ni-Si-C Ternary Systems under Laser Irradiation

Inter-diffusion, melting and reaction interplay in Ni/4H-SiC under excimer laser annealing

TXRF/GIRXF high precision laboratory setup with high flux monochromatic sources

Periodic Reporting for period 3 - MADEin4 (Metrology Advances for Digitized ECS industry 4.0)

Closed-Loop Active Model Diagnosis Using Bhattacharyya Coefficient: Application to Automated Visual Inspection.

Automatic Defect Detection in Epitaxial Layers by Micro Photoluminescence Imaging

Electrodeposition of NiSn-rGO Composite Coatings from Deep Eutectic Solvents and Their Physicochemical Characterization

LASSO-based Health Indicator Extraction Method for Semiconductor Manufacturing Processes

Data fusion by artificial neural network for hybrid metrology development

Multi-branch neural network for hybrid metrology improvement

MFIG — A Mass Filtered Ion Gauge

An optical system and image processing tool for predicting PIN malfunctioning in growth Chambers of semiconductors

Structural and electrical characterization of Ni-based ohmic contacts on 4H-SiC formed by solid-state laser annealing

Robust Classification of Intramuscular EMG Signals to Aid the Diagnosis of Neuromuscular Disorders

Particle detection using closed-loop active model diagnosis

Closed-loop active object recognition with constrained illumination power

Predictive virtual processes, metrology and maintenance in power device manufacturing

High Throughput Scanning Probe Metrology for High-NA EUV photoresist profiling

Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography

Study of plasma etching impact on chemoepitaxy directed self-assembly

D6.3.4: SEMICON Europa 2021 Dissemination Factsheets