OPTIMAL platform
Project: OPTIMAL
Updated at: 30-01-2024
Project: OPTIMAL
Updated at: 30-01-2024
Project: AI REGIO
Updated at: 25-01-2024
Project: MARKET4.0
Updated at: 12-01-2024
Project: AI REGIO
Updated at: 17-07-2023
Project: AI REGIO
Updated at: 04-07-2023
Project: AI REGIO
Updated at: 04-07-2023
Project: AI REGIO
Updated at: 04-07-2023
Project: AI REGIO
Updated at: 04-07-2023
Project: AI REGIO
Updated at: 04-07-2023
Project: AI REGIO
Updated at: 04-07-2023
Project: AI REGIO
Updated at: 04-07-2023
Project: AI REGIO
Updated at: 04-07-2023
Project: AI REGIO
Updated at: 04-07-2023
Project: AI REGIO
Updated at: 04-07-2023
Project: AI REGIO
Updated at: 04-07-2023
Project: AI REGIO
Updated at: 04-07-2023
Updated at: 18-02-2023
The OPTIMAL project will integrate for the first-time different laser lithography technologies, quality monitoring systems and processes in one platform for the development of structures with high depth, dimensions in the range from 100 nm to sub-mm, 2D&3D shape on flat surface, combining parallel & serial patterning, no need for external treatments on samples, increased speed and large area.