EFFRA Innovation Portal

Wavelet-based robust estimation and variable selection in nonparametric additive models

Project: MADEin4

Updated at: 29-04-2024

Analysis of Line-Edge Roughness Using EUV Scatterometry

Project: MADEin4

Updated at: 29-04-2024

Pulsed Laser Deposition of SWCNTs on Carbon Fibres: Effect of Deposition Temperature

Project: MADEin4

Updated at: 29-04-2024

Similarity-based Brownian Motion Approach for Remaining Useful Life Prediction

Project: MADEin4

Updated at: 29-04-2024

High-NA EUV photoresist metrology using high-throughput scanning probe microscopy

Project: MADEin4

Updated at: 29-04-2024

MFIG - a Mass Filtered Ion Gauge

Project: MADEin4

Updated at: 29-04-2024

Prediction of Yield in semiconductor production from defects optically detected on the Wafers

Project: MADEin4

Updated at: 29-04-2024

High-Speed Tapping Mode AFM Utilizing Recovery of Tip-Sample Interaction

Project: MADEin4

Updated at: 29-04-2024

Automatic Defect Detection in Epitaxial Layers by Micro Photoluminescence Imaging

Project: MADEin4

Updated at: 29-04-2024

TXRF/GIRXF high precision laboratory setup with high flux monochromatic sources

Project: MADEin4

Updated at: 29-04-2024

TXRF/GIXRF high precision laboratory setup with high flux monochromatic source

Project: MADEin4

Updated at: 29-04-2024

Simulations of the Ultra-Fast Kinetics in Ni-Si-C Ternary Systems under Laser Irradiation

Project: MADEin4

Updated at: 29-04-2024

Inter-diffusion, melting and reaction interplay in Ni/4H-SiC under excimer laser annealing

Project: MADEin4

Updated at: 29-04-2024

Periodic Reporting for period 3 - MADEin4 (Metrology Advances for Digitized ECS industry 4.0)

Project: MADEin4

Updated at: 29-04-2024

Electrodeposition of NiSn-rGO Composite Coatings from Deep Eutectic Solvents and Their Physicochemical Characterization

Project: MADEin4

Updated at: 29-04-2024

LASSO-based Health Indicator Extraction Method for Semiconductor Manufacturing Processes

Project: MADEin4

Updated at: 29-04-2024

Multi-branch neural network for hybrid metrology improvement

Project: MADEin4

Updated at: 29-04-2024

Data fusion by artificial neural network for hybrid metrology development

Project: MADEin4

Updated at: 29-04-2024

Closed-Loop Active Model Diagnosis Using Bhattacharyya Coefficient: Application to Automated Visual Inspection.

Project: MADEin4

Updated at: 29-04-2024

MFIG — A Mass Filtered Ion Gauge

Project: MADEin4

Updated at: 29-04-2024

An optical system and image processing tool for predicting PIN malfunctioning in growth Chambers of semiconductors

Project: MADEin4

Updated at: 29-04-2024

Robust Classification of Intramuscular EMG Signals to Aid the Diagnosis of Neuromuscular Disorders

Project: MADEin4

Updated at: 29-04-2024

Predictive virtual processes, metrology and maintenance in power device manufacturing

Project: MADEin4

Updated at: 29-04-2024

High Throughput Scanning Probe Metrology for High-NA EUV photoresist profiling

Project: MADEin4

Updated at: 29-04-2024

D6.3.4: SEMICON Europa 2021 Dissemination Factsheets

Project: MADEin4

Updated at: 29-04-2024

Structural and electrical characterization of Ni-based ohmic contacts on 4H-SiC formed by solid-state laser annealing

Project: MADEin4

Updated at: 29-04-2024

Closed-loop active object recognition with constrained illumination power

Project: MADEin4

Updated at: 29-04-2024

Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography

Project: MADEin4

Updated at: 29-04-2024

Study of plasma etching impact on chemoepitaxy directed self-assembly

Project: MADEin4

Updated at: 29-04-2024

Particle detection using closed-loop active model diagnosis

Project: MADEin4

Updated at: 29-04-2024

Resources

Selected filters:

Wavelet-based robust estimation and variable selection in nonparametric additive models

Analysis of Line-Edge Roughness Using EUV Scatterometry

Pulsed Laser Deposition of SWCNTs on Carbon Fibres: Effect of Deposition Temperature

Similarity-based Brownian Motion Approach for Remaining Useful Life Prediction

High-NA EUV photoresist metrology using high-throughput scanning probe microscopy

MFIG - a Mass Filtered Ion Gauge

Prediction of Yield in semiconductor production from defects optically detected on the Wafers

High-Speed Tapping Mode AFM Utilizing Recovery of Tip-Sample Interaction

Automatic Defect Detection in Epitaxial Layers by Micro Photoluminescence Imaging

TXRF/GIRXF high precision laboratory setup with high flux monochromatic sources

TXRF/GIXRF high precision laboratory setup with high flux monochromatic source

Simulations of the Ultra-Fast Kinetics in Ni-Si-C Ternary Systems under Laser Irradiation

Inter-diffusion, melting and reaction interplay in Ni/4H-SiC under excimer laser annealing

Periodic Reporting for period 3 - MADEin4 (Metrology Advances for Digitized ECS industry 4.0)

Electrodeposition of NiSn-rGO Composite Coatings from Deep Eutectic Solvents and Their Physicochemical Characterization

LASSO-based Health Indicator Extraction Method for Semiconductor Manufacturing Processes

Multi-branch neural network for hybrid metrology improvement

Data fusion by artificial neural network for hybrid metrology development

Closed-Loop Active Model Diagnosis Using Bhattacharyya Coefficient: Application to Automated Visual Inspection.

MFIG — A Mass Filtered Ion Gauge

An optical system and image processing tool for predicting PIN malfunctioning in growth Chambers of semiconductors

Robust Classification of Intramuscular EMG Signals to Aid the Diagnosis of Neuromuscular Disorders

Predictive virtual processes, metrology and maintenance in power device manufacturing

High Throughput Scanning Probe Metrology for High-NA EUV photoresist profiling

D6.3.4: SEMICON Europa 2021 Dissemination Factsheets

Structural and electrical characterization of Ni-based ohmic contacts on 4H-SiC formed by solid-state laser annealing

Closed-loop active object recognition with constrained illumination power

Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography

Study of plasma etching impact on chemoepitaxy directed self-assembly

Particle detection using closed-loop active model diagnosis