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DIGITbrain | Digital twins bringing agility and innovation to manufacturing SMEs, by empowering a network of DIHs with an integrated digital platform that enables Manufacturing as a Service (MaaS)

01-07-2020

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31-12-2023

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MiE WP26-27 Consultation and context pointers
MiE_25-27_RP01: Sustainable value network resilience and competitiveness through robust and flexible production technologies
Comment:

The availability of industrial-product capacity will facilitate the implementation of MaaS, which will allow manufacturing SMEs to access advanced manufacturing facilities within their regions or to distribute their orders across different ones.

OPTIMAL | Automated Maskless Laser Lithography Platform for First Time Right Mixed Scale Patterning

01-10-2022

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30-09-2026

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MiE WP26-27 Consultation and context pointers
MiE_25-27_RP01: Sustainable value network resilience and competitiveness through robust and flexible production technologies
Result items:
OPTIMAL platform
OPTIMAL platform

The OPTIMAL approach involves various disciplines, which interact with each other in order to achieve the project objectives. Material research and photochemistry is needed to develop the suitable photoresists (MRT). Laser technology knowledge (JOR, ISE) is required for developing novel laser lithography methods, machines, and processes. The electronics finds its application in the optical based sensors for in-line monitoring, controlling the laser sources and patterning (ILC, DPX). The software engineering expertise (UPR) completes the required skills for the development of self-learning algorithms for generating the virtual photomasks. Mechanical and environmental engineering deal with the equipment and manufacturing processes and their life cycle assessment (JOR). Experts in training and communication science (ILC, UPR) will design workshops and training materials to explain and promote the developed technologies to broad public and stakeholders. 

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